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US Patent Issued to SHIN-ETSU CHEMICAL on June 23 for "Resist composition and pattern forming process" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,714, issued on June 23, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo). "Resist composition and pattern forming process" was invented ... Read More


US Patent Issued to Chang Chun Plastics on June 23 for "Photosensitive resin film and application thereof" (Taiwanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,715, issued on June 23, was assigned to Chang Chun Plastics Co. Ltd. (Taipei City, Taiwan). "Photosensitive resin film and application ther... Read More


US Patent Issued to NISSAN CHEMICAL on June 23 for "Chemical-resistant protective film" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,716, issued on June 23, was assigned to NISSAN CHEMICAL Corp. (Tokyo). "Chemical-resistant protective film" was invented by Tokio Nishita (... Read More


US Patent Issued to NISSAN CHEMICAL on June 23 for "Resist underlayer film-forming composition" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,718, issued on June 23, was assigned to NISSAN CHEMICAL Corp. (Tokyo). "Resist underlayer film-forming composition" was invented by Hirokaz... Read More


US Patent Issued to NISSAN CHEMICAL on June 23 for "Resist underlayer film-forming composition" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,719, issued on June 23, was assigned to NISSAN CHEMICAL Corp. (Tokyo). "Resist underlayer film-forming composition" was invented by Hiroto ... Read More


US Patent Issued to Semes, Seoul National University R&DB Foundation on June 23 for "Apparatus for supplying liquid and apparatus for treating substrate" (South Korean Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,720, issued on June 23, was assigned to Semes Co. Ltd. (Chungcheongnam-do, South Korea) and Seoul National University R&DB Foundation (Seoul... Read More


US Patent Issued to Semes on June 23 for "Apparatus and method for treating substrate" (South Korean Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,721, issued on June 23, was assigned to Semes Co. Ltd. (Chungcheongnam-do, South Korea). "Apparatus and method for treating substrate" was ... Read More


US Patent Issued to Georgia Tech Research on June 23 for "System and method to control defects in projection-based sub-micrometer additive manufacturing" (Georgia Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,722, issued on June 23, was assigned to Georgia Tech Research Corp. (Atlanta). "System and method to control defects in projection-based su... Read More


US Patent Issued to FUJIFILM on June 23 for "Washout processor and washing method" (Japanese Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,723, issued on June 23, was assigned to FUJIFILM Corp. (Tokyo). "Washout processor and washing method" was invented by Masato Shirakawa (Ha... Read More


US Patent Issued to Taiwan Semiconductor Manufacturing on June 23 for "Lithography system with non-invasive monitoring and methods" (Taiwanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,724, issued on June 23, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Lithography system with non-invasiv... Read More